Semiconductor device with magnetically permeable heat sink

ABSTRACT

A semiconductor device is attached to a heat sink by glue that is both thermally conductive and magnetically permeable. The glue fills different features in the surface of the semiconductor device so that there is good coupling between the semiconductor device and the heat sink. The glue is filled with magnetic particles so that the glue is magnetically permeable. The semiconductor device is formed with the heat sink at the wafer level and then singulated after attachment of the heat sink with the glue.

FIELD OF THE INVENTION

This invention relates to semiconductors, and more particularly, to themanufacture of semiconductor devices having heat sinks attached thereto.

RELATED ART

A major issue in semiconductors is heat generation and the need todissipate that heat. Also becoming important is various kinds ofshielding. For example in magnetoresistive random access memories(MRAMs) the logic state of the memory cell is changed by application ofmagnetic fields. Thus strong spurious magnetic signals can detrimentallyalter the state of such a memory. Also RF can detrimentally affectlogic. One of the difficulties with such shielding is the coupling ofthe shielding to a stacked semiconductor device. One of the proposedsolutions is to bond wafers together using glass to glass bonding. Onedifficulty with this approach is that the glass must be very thin toobtain good coupling and planarity of the glass surfaces being bonded,and the wafers must exhibit a high degree of planarity. If there is notsufficient planarity, there is not good coupling.

Thus, there is a need for heat sinks that overcome these difficulties.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention is illustrated by way of example and not limitedby the accompanying figures, in which like references indicate similarelements, and in which:

FIG. 1 is cross section of a semiconductor device with an attached heatsink according to an embodiment of the invention;

FIG. 2 is a cross section showing more detail of that depicted in FIG.1; and

FIG. 3 is a cross section of a semiconductor device with an attachedheat sink according to another embodiment of the invention.

Skilled artisans appreciate that elements in the figures are illustratedfor simplicity and clarity and have not necessarily been drawn to scale.For example, the dimensions of some of the elements in the figures maybe exaggerated relative to other elements to help improve theunderstanding of the embodiments of the present invention.

DETAILED DESCRIPTION OF THE DRAWINGS

In one aspect, a semiconductor device is attached to a heat sink by gluethat is both thermally conductive and magnetically permeable. The gluefills different features in the surface of the semiconductor device sothat there is good coupling between the semiconductor device and theheat sink. The glue is filled with magnetic particles so that the glueis magnetically permeable. This is better understood by reference to thedrawings and the following description.

Shown in FIG. 1 is semiconductor device 10 comprising a final metallayer 12, an interconnect layer 14, a semiconductor substrate 16, and aninterconnect 18. Also shown in FIG. 1 is a thermallyconductive/magnetically permeable substrate 22 coupled to semiconductordevice 10 by a thermally conductive/magnetically permeable glue layer20. Substrate 22 can also be considered a heat sink 22. Semiconductorsubstrate 16 preferably comprises silicon having transistors formedtherein so that it is an active semiconductor substrate. Interconnectlayers 14 and 18 are for providing interconnections between differenttransistors and between transistors and power supply voltages. In thisexample, interconnect layer 14 is shown as being on a top side ofsemiconductor substrate 16 and interconnect layer 18 is shown as beingon a bottom side of semiconductor substrate 16. A final metal layer 12is on interconnect layer 14 and provides connections for mounting thesemiconductor device. Layers 12-22 are originally assembled at the timesemiconductor substrate 16 is a semiconductor wafer prior to the timedie on the wafer are singulated. This semiconductor device 10 is amagnetoresistive access memory in this described embodiment but mayalternatively be another type of semiconductor circuit.

Interconnect layer 18 is formed on semiconductor substrate 16 on thesame side of semiconductor substrate as the gates of transistors areformed. Substrate 22 is attached to interconnect layer 18 by glue layer20. Semiconductor substrate 16 is then ground down to be a thinnedsubstrate having a thickness of about 50 microns. Interconnect layer 14is then formed followed by the last metal layer which forms final metallayer 12. In the preferred case, the final metal layer has bumps whichare used to connect to flip-chip package structure. After the formationof final metal layer 12, the resulting device is singulated intoindividual die ready for packaging as desired. Thus, the formation ofdevice 10 is formed at the wafer level prior to singulation of theindividual die.

Glue layer 20 comprises a glue that is both thermally conductive andmagnetically permeable. An example of such glue is a nanosilicateunderfill available from 3M Corporation. The particular viscosity andtype of metal are selectable for the particular manufacturing and devicecharacteristics desired. In this case, the particles used for thecolloid fill are cobalt but could also be something else such as nickelor iron or combinations of any of the three. Also other magneticallypermeable materials could be used. The fill particles can be metalcoated nanosilica or glass spheres and that coating can be magneticnickel, cobalt, iron or other magnetic materials. For the designs wheremagnetic shielding is not desired, then other materials such as carbon,aluminum, metal oxides, and other metals could be used to give varyingdegrees of thermal and electrical conductivity. The epoxy, bonding agent34 in this case, in combination with the colloid fill materials is alsothermally conductive. The magnetic permeability of the particles used asthe colloid fill provide for magnetic shielding from the bottom. In theattachment process, the remaining portion of semiconductor device 10would receive shielding. For example, in the case of flip-chip, amagnetic fillet could be used.

Portions of glue layer 20 and interconnect layer 18 are shown in moredetail in FIG. 2. The portion of interconnect layer 18 shown in FIG. 2comprises a dielectric layer 24 on glue layer 20, a metal layer 26 ondielectric layer 24, and a dielectric layer 28 on metal layer 26. Anopening 30 in dielectric layer 24 results in glue layer 20 be in contactwith metal layer 24 through opening 24. Preferably metal layer 26 is forbeing connected to ground. Particle 32 is an exemplary particle of thecolloid fill. Particle 32 has an irregular shape, but there maysituations in which another shape, such as spherical, may be beneficial.

Another material that can be useful as glue layer 20 is benzocyclobutene(BCB) with colloidal particles such as those already described embeddedtherein. BCB itself is not thermally conductive, magnetically permeable,or conductive, but it is a very effective glue. With the embeddedparticles, it provides for magnetic permeability as well as thermalconductivity. With the colloidal particle density as shown in FIG. 2,glue layer 20 will not be electrically conductive. The colloidalparticle density can, however, be increased so that glue 20 can beelectrically conductive. In such case the resulting glue is electricallyconductive, thermally conductive, and magnetically permeable. Thiselectrical conductivity is beneficial if it is desirable to makeelectrical contact between substrate 22 and the ground of semiconductorsubstrate 16. A thickness of 1 to 2 microns is a desired thickness forglue layer 20. By being this thick and being spun-on, glue layer 20provides for good coupling even if the surfaces of interconnect 18 andsubstrate 22 are not fully planar. In fact glue layer 20 provides forthe opportunity to make direct contact between glue layer 20 and metallayer 26. The desired thermal conductivity of glue layer 20 is at least1 watt/meter-degree where degree is stated in Kelvin. The desiredmagnetic permeability is balanced against the ability to spin the gluebecause the viscosity increases with increasing metal content. Thepermeability will increase with metal content, and the fill epoxy willbe permeable in proportion to the magnetic material contained within theglue.

An effective material for substrate 22 is silicon carbide coated withnickel. Silicon carbide provides good thermal conductivity, and nickelprovides good magnetic permeability. Other magnetic materials such ascobalt and iron can be used. If glue layer 20 is sufficientlymagnetically permeable for the particular application, then the nickelcoating may not be necessary. In such case substrate 22 would not itselfbe magnetically permeable. The silicon carbide material is beneficialfor this application also because of its coefficient of thermalexpansion (CTE), which can be effectively matched to that of silicon.

Shown in FIG. 3 is a semiconductor device 40 comprising a final metallayer 42, an interconnect layer 44, a semiconductor substrate 46, aninterconnect layer 48, a semiconductor substrate 50, and an interconnectlayer 52. Similar to semiconductor device 10 of FIG. 1, a thermallyconductive/magnetically permeable substrate 56 is coupled tosemiconductor device 40 at interconnect 52 by a conductive/magneticallypermeable glue layer 54. This substrate 56 and glue layer 54 are thesame as substrate 22 and glue layer 20 of FIG. 1. Semiconductor device40 is different from semiconductor device 10 by having an additionalsemiconductor substrate and interconnect layer. This shows theapplicability of glue layer 54 and substrate 56 to three dimensionalwafer structures. The interface between glue layer 54 and interconnectlayer 52 may have a portion that is the same as that shown for theinterface between glue layer 20 and interconnect layer 18 shown in FIG.2. The formation process follows that for the structure of FIG. 1through the formation of interconnect layer 14 which is analogous tointerconnect layer 48. After the formation of interconnect layer 48,semiconductor substrate is applied followed by the formation ofinterconnect layer 44 and then final metal layer 42. This structure ofFIG. 3 is thus originally formed at the wafer level then singulated.

In the foregoing specification, the invention has been described withreference to specific embodiments. However, one of ordinary skill in theart appreciates that various modifications and changes can be madewithout departing from the scope of the present invention as set forthin the claims below. For example, other materials than those describedfor the various layers may be used. Additional semiconductor substratelayers may be used. The semiconductor substrates may be different fromsilicon and may be different from each other as well. The semiconductorsubstrates may be considered to have just one or more than oneintegrated circuit present. In practice the substrates are bondedtogether as wafers and then singulated but this could be done in adifferent way. Accordingly, the specification and figures are to beregarded in an illustrative rather than a restrictive sense, and allsuch modifications are intended to be included within the scope ofpresent invention.

Benefits, other advantages, and solutions to problems have beendescribed above with regard to specific embodiments. However, thebenefits, advantages, solutions to problems, and any element(s) that maycause any benefit, advantage, or solution to occur or become morepronounced are not to be construed as a critical, required, or essentialfeature or element of any or all the claims. As used herein, the terms“comprises,” “comprising,” or any other variation thereof, are intendedto cover a non-exclusive inclusion, such that a process, method,article, or apparatus that comprises a list of elements does not includeonly those elements but may include other elements not expressly listedor inherent to such process, method, article, or apparatus.

1. An apparatus comprising: a thinned active semiconductor substrate; asupport substrate for supporting the thinned active semiconductorsubstrate; and a magnetically permeable glue disposed between the activesemiconductor substrate and the support substrate.
 2. The apparatus ofclaim 1 wherein the support substrate is magnetically permeable.
 3. Theapparatus of claim 2 wherein the support substrate and the glue eachcomprise a magnetically permeable substance, the magnetically permeablesubstance comprising at least one of the group consisting of cobalt;nickel and iron.
 4. The apparatus of claim 3 wherein the supportsubstrate comprises: a first layer having a coefficient of thermalexpansion substantially equal to the integrated circuit, the first layerbeing in contact with the glue; and a second layer coupled to the firstlayer, the second layer comprising the magnetically permeable substance.5. The apparatus of claim 3 wherein the active semiconductor substratecomprises a magnetoresistive random access memory.
 6. The apparatus ofclaim 1 wherein the glue comprises: a bonding agent; and a magneticpermeability enhancing agent.
 7. The apparatus of claim 6 wherein thebonding agent comprises one of the group consisting of benzocyclobutene(BCB) and an epoxy.
 8. The apparatus of claim 6 wherein the magneticallypermeable enhancing agent comprises at least one of the group consistingof cobalt, nickel and iron.
 9. The apparatus of claim 6 wherein themagnetic permeability enhancing agent comprises a plurality ofmagnetically-permeable, colloidal-sized particles suspended in thebonding agent.
 10. The apparatus of claim 9 wherein the glue has a firstthickness and the particles have an average maximum dimension notsubstantially greater than half the first thickness.
 11. The apparatusof claim 9 wherein the active semiconductor substrate has a thickness ofless than 200 microns.
 12. An apparatus comprising: a thinned integratedcircuit wafer; a support wafer having a first characteristic, the firstcharacteristic being at least one of the group consisting of thermallyconductive, electrically conductive and magnetically permeable; and aglue having the first characteristic, the glue being disposed betweenthe integrated circuit wafer and the support wafer.
 13. The apparatus ofclaim 12 wherein the integrated circuit wafer comprises a plurality ofthe integrated circuits.
 14. The apparatus of claim 13 wherein theapparatus comprises a three-dimensional wafer-to-wafer bonded structureincluding the integrated circuits, the substrate and the glue.
 15. Theapparatus of claim 12 wherein the glue comprises: a bonding agent; and afirst characteristic enhancing agent.
 16. The apparatus of claim 15wherein the bonding agent comprises one of the group consisting ofbenzocyclobutene (BCB) and an epoxy.
 17. The apparatus of claim 15wherein the first characteristic enhancing agent comprises a pluralityof colloidal-sized particles suspended in the bonding agent, thecolloidal particles being monolithic and coated nanosilica spheres. 18.The apparatus of claim 12 wherein the glue has a first thickness and theparticles have an average maximum dimension not substantially greaterthan half the first thickness.
 19. The apparatus of claim 12 wherein thefirst characteristic is magnetically permeable, and the substrate andthe glue each comprise a magnetically permeable substance, themagnetically permeable substance comprising at least one of the groupconsisting of cobalt; nickel and iron.
 20. The apparatus of claim 19wherein the substrate comprises: a first layer having a coefficient ofthermal expansion substantially equal to the integrated circuit, thefirst layer having the first surface; and a second layer comprising themagnetically permeable substance.
 21. The apparatus of claim 19 whereinthe integrated circuit is a magnetic memory.
 22. The apparatus of claim12 wherein the substrate comprises one of the group consisting ofsilicon carbide and heavily doped silicon.
 23. The apparatus of claim 12wherein the first characteristic is electrically conductive, and thesubstrate and the glue each comprise at least one of the groupconsisting of a metal and carbon.
 24. The apparatus of claim 12 whereinthe first characteristic is thermally conductive, and the substrate andthe glue each comprise at least one of the group consisting of a metal,a metal oxide, and cobalt.
 25. A method of making a semiconductor devicecomprising: providing an integrated circuit bearing structure with afirst surface; selecting a substrate structure material having a firstcharacteristic, the first characteristic being at least one of the groupconsisting of thermally conductive, electrically conductive andmagnetically permeable; providing a substrate structure comprised of theselected substrate structure material, the substrate structure having asecond surface; providing a glue having the first characteristic; andgluing the integrated circuit bearing structure to the substratestructure using the glue.
 26. The method of claim 25 wherein the step ofproviding the glue comprises: providing a bonding agent; and providingan amount of first characteristic enhancing agent; and mixing thebonding agent and the first characteristic enhancing agent.
 27. Themethod of claim 26 wherein the bonding agent is provided in liquid formand the first characteristic enhancing agent is provided in particulateform, and wherein the bonding agent and the first characteristicenhancing agent are mixed to provide a colloidal glue such thatparticles of the first characteristic enhancing agent are dispersedwithin a substantially continuous medium of the bonding agent.
 28. Themethod of claim 25 wherein the step of gluing the integrated circuitbearing structure to the substrate structure comprises: depositing theglue on at least one of the first and second surfaces; placing the firstand second surfaces in proximity with each other such that the glueextends between the first and second surfaces; and curing the glue tobond the integrated circuit bearing structure to the substratestructure.
 29. The method of claim 25 wherein the integrated circuitbearing structure is a wafer, the method comprising: singulating aplurality of integrated circuits from the wafer, each of the integratedcircuits comprising a portion of the wafer, the substrate and the glue.30. The method of claim 25 further comprising: selecting the substratestructure material to have a second characteristic, the secondcharacteristic being another one of the group consisting of thermallyconductive, electrically conductive and magnetically permeable.
 31. Themethod of claim 25 wherein the integrated circuit bearing structure is afirst integrated circuit bearing structure, the method furthercomprising: providing a second integrated circuit bearing structure;connecting the second integrated circuit bearing structure to the firstintegrated circuit bearing structure.
 32. A method of making a colloidalglue comprising: selecting a characteristic from the group of thermallyconductive, electrically conductive, and magnetically permeable;providing a glue having the selected characteristic; and bonding anintegrated circuit layer to a substrate layer using the glue having theselected characteristic.
 33. The method of claim 32 further comprising:thinning the integrated circuit layer after bonding.
 34. The method ofclaim 32 further comprising: providing the substrate layer with theselected characteristic.
 35. The method of claim 32 wherein theproviding the glue comprises: providing a base adhesive agent; andadding a characteristic agent to the base adhesive to provide a gluehaving the selected characteristic in colloidal suspension.